| 摘要 |
An inventive device 2 for generating X-ray or XUV radiation, includes a means for directing a particle beam 12 of electrically charged particles towards a target 16. According to the invention, a deflection means for deflecting the particle beam 12 is of such a type that the central axis 18 of the particle beam 12 passes through a first point of deflection 20 and a second point of deflection 22 located at a distance from the first point of deflection 20 in the direction of propagation of the beam, in that the first and second points of deflection 20, 22 lie on an axis in line with a determined or determinable point of impact 24 of the particle beam 12 the target 16, and in that the particle beam 12 can be deflected by the deflection means in the direction of propagation of the beam in the region of one point of deflection 20, 22 irrespective of a deflection of the particle beam 12 in the region of the other point of deflection.
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