| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for forming a monolayer capable of depositing a uniformly and densely filled SAM (self-assembled monolayer) on a substrate of a large area. SOLUTION: The apparatus deposits a self-assembled monolayer on a substrate by vaporizing a liquid raw material containing self-assembled molecules, and comprises a film deposition chamber for holding the substrate inside thereof, and an injection valve for directly injecting the liquid raw material into the film deposition chamber. COPYRIGHT: (C)2007,JPO&INPIT
|
