MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, LIBRARY USED FOR MANUFACTURE THEREOF, RECORDING MEDIUM, AND SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of semiconductor device for enabling high-speed and high-precision formation of patterns.

SOLUTION: Size-accuracy at the area near cell boundary can be acquired by completing single process for each cell through implementation of OPC after decomposition of layout data for each cell in the OPC processing step, and by executing OPC only to the cell boundary after arrangement of the OPC application cell of each cell on a chip. Moreover, OPC at the cell boundary can be simplified and executed quickly by uniformly shrinking the pattern on the cell boundary.

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