SURFACE PROCESSING METHOD AND MANUFACTURING METHOD OF STRUCTURE

摘要

PROBLEM TO BE SOLVED: To form a structure having high durability.SOLUTION: A manufacturing method of a structure, comprises the steps of: forming a modification part 230 by focusing a focal point 160 of a laser beam to an inner part of an Si wafer 200 and scanning the laser beam, and locally heating a part corresponding to the focal point 160 of laser beam of the Si wafer 200 (a laser beam irradiation step); forming an ion implantation layer 240 to the Si wafer 200 by performing ion implantation to the Si water 200 (an ion implantation step); and forming a projection structure 250 to a surface 210 of the Si wafer 200 by acting a blistering 241 on the modification part 230 by heating a whole of the Si wafer 200 and generating the blistering 241 based on the ion implantation layer 240 to the Si wafer 200 (a heating step).SELECTED DRAWING: Figure 2