| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method used to perform an annealing process on desired regions of a substrate.SOLUTION: In one embodiment, pulses of electromagnetic energy are delivered to a substrate by using a flash lamp or a laser apparatus. The pulses may have length from about 1 nsec to about 10 msec, and each pulse has less energy than that required to melt substrate material. Interval between the pulses is generally long enough to allow the energy imparted by each pulse to dissipate completely. Thus, each pulse completes a micro-anneal cycle. The pulses may be delivered to the entire substrate at once, or to portions of the substrate at a time.SELECTED DRAWING: Figure 6A |
