SELF-ORGANIZED-FILM FORMING METHOD, PATTERN FORMING METHOD, AND SELF-ORGANIZED-FILM FORMING COMPOSITION

摘要

The present invention relates to a self-organized-film forming method comprising a step for forming a coating film on a substrate by using a self-organized-film forming composition that contains a solvent and at least one type of a first polymer that can form a phase-separated structure through self-organization, wherein the solvent contains an aromatic-ring-containing compound. It is preferred that self-organized-film forming method further comprise a step for heating the coating film. It is preferred that the solvent contain the aromatic-ring-containing compound at 80 mass% or less and 50 mass% or more. It is preferred that the self-organized-film forming composition further contain a second polymer having smaller surface free energy than the first polymer and that the second polymer be unevenly distributed above the self-organized film.