| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a permanent pattern forming method by which permanent patterns such as a protective film, an interlayer insulation film and a solder resist pattern can be efficiently formed with high definition, by improving exposure performance without incurring a cost increase of an apparatus and a reduction of exposure speed. <P>SOLUTION: The permanent pattern forming method includes at least exposing a photosensitive layer 12 by modulating light from a light illuminating means by a light modulating means which receives light from the light illuminating means and modulates it based on pattern information, and image-forming the light modulated by the light modulating means on a surface of the photosensitive layer 12 to be exposed through an image-forming means and a focusing means, wherein, in the exposure, the light modulated by the light modulating means is image-formed only in a nearly rectangular region 81T including the central part of the imaging means, and a minor side direction of the nearly rectangular region 81T is steered to an undulation direction of the photosensitive layer 12. <P>COPYRIGHT: (C)2007,JPO&INPIT |
