RESIST DEVELOPMENT DEVICE, RESIST DEVELOPMENT METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a resist development device capable of supplying a developer to a semiconductor wafer much more than a conventional resist development device without increasing the quantity of the developer to be sprayed.SOLUTION: The resist development device is configured to spray the developer towards a carrier 100 in which a plurality of semiconductor wafers W can be accommodated, while revolving the carrier 100. The resist development device comprises: a rotational body that can be rotated around an axis A of rotation; a cradle that can be revolved in a predetermined direction D of rotation while holding the carrier 100; and a plurality of inner spray nozzles 32 that spray the developer from the inside of a trajectory to the outside of the trajectory. The inner spray nozzle 32 includes a spray hole 33 that defines a spray range at one side (upper side of revolving movement) within a spray range of the developer obliquely to the axis A of rotation downwards in a direction of gravity closer to one side and upwards in the direction of gravity closer to the other side.SELECTED DRAWING: Figure 3