发明名称 Determining a state of a high aspect ratio hole using measurement results from an electrostatic measurement device
摘要 A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole.
申请公布号 US9448253(B2) 申请公布日期 2016.09.20
申请号 US201514719193 申请日期 2015.05.21
申请人 APPLIED MATERIALS ISRAEL LTD. 发明人 Chirko Konstantin;Litman Alon
分类号 H01J37/00;G01Q60/30;G01Q30/02;H01J37/28 主分类号 H01J37/00
代理机构 Kilpatrick Townsend & Stockton LLP 代理人 Kilpatrick Townsend & Stockton LLP
主权项 1. A method for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, the method comprises: obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing, by a processor, the multiple measurement results to determine a state of the HAR hole based upon calculating a change of a potential offset over time.
地址 Rehovot IL