发明名称 |
Method for manufacturing a suspended single carbon nanowire and piled nano-electrode pairs |
摘要 |
The present invention provides a method for manufacturing a suspended single carbon nanowire and piled nano-electrode pairs, and a suspended single carbon nanowire and piled nano-electrode pairs manufactured using said method. A suspended single carbon nanowire, which is manufactured at a high yield by the method for manufacturing a suspended single carbon nanowire according to the present invention, has a minimized dimension, and a suspended carbon nanomesh, which is manufactured at a high yield by the method for manufacturing piled nano-electrode pairs according to the present invention, is thin and dense. The present invention also provides a gas sensor or an electrochemical sensor, to which a suspended single carbon nanowire and piled nano-electrode pairs manufactured by the method according to the present invention are applied. |
申请公布号 |
US9513555(B2) |
申请公布日期 |
2016.12.06 |
申请号 |
US201414781261 |
申请日期 |
2014.03.28 |
申请人 |
SK INNOVATION CO., LTD.;UNIST ACADEMY-INDUSTRY RESEARCH CORPORATION |
发明人 |
Shin Heung-Joo;Heo Jeong-Il;Lim Yeong-Jin |
分类号 |
G03F7/40;G03F7/16;G03F7/20;G03F7/32;G01N33/00;B82Y40/00;G01N27/327;B82Y15/00 |
主分类号 |
G03F7/40 |
代理机构 |
IP & T Group LLP |
代理人 |
IP & T Group LLP |
主权项 |
1. A method for manufacturing a suspended single carbon nanowire comprising:
(a) depositing an insulation layer on a substrate; (b) coating a photoresist on the insulation layer; (c) forming photoresist post parts on an upper portion of the insulation layer by primarily exposing the photoresist through a photomask having a post shape; (d) forming a micro photoresist wire connecting the photoresist post parts to each other by secondarily exposing an upper portion of the photoresist between the photoresist post parts in a shape of a micro-sized wire connecting the photoresist post parts through a photomask having a wire shape; (e) removing the photoresist of a remaining portion except for portions exposed in steps (c) and (d) by performing a development process; and (f) creating a vacuum condition, and forming the suspended single carbon nanowire by pyrolyzing the photoresist post parts and the micro-sized wire remaining after step (e), wherein the pyrolysis of step (f) is performed in two steps including a first step and a second step, the second step being performed at a temperature higher than that of the first step. |
地址 |
Seoul KR |