发明名称 |
Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound |
摘要 |
A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.; |
申请公布号 |
US9513548(B2) |
申请公布日期 |
2016.12.06 |
申请号 |
US201414242957 |
申请日期 |
2014.04.02 |
申请人 |
JSR CORPORATION |
发明人 |
Asano Yuusuke;Satou Mitsuo;Nakashima Hiromitsu;Kasahara Kazuki;Oizumi Yoshifumi;Hori Masafumi;Kawakami Takanori;Matsuda Yasuhiko;Nakahara Kazuo |
分类号 |
G03F7/039;G03F7/30;C08F20/22;G03F7/004;G03F7/038;G03F7/20 |
主分类号 |
G03F7/039 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A radiation-sensitive resin composition comprising:
a first polymer comprising an acid-labile group; an acid generator to generate an acid upon exposure to radiation; and a second polymer comprising a fluorine atom and a repeating unit shown by formula (c2-1), the second polymer having a fluorine atom content higher than a fluorine atom content of the first polymer, and being in an amount of 0.1 to 20 parts by mass based on 100 parts by mass of the first polymer, wherein n is an integer from 1 to 3, X1 represents a single bond, a difluoromethylene group, or a linear or branched perfluoroalkylene group having 2 to 20 carbon atoms, R2 represents a single bond, a divalent chain hydrocarbon group having 1 to 10 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms, wherein each R2 is a same as or different from each other when n is 2 or 3, R3 represents an (n+1)-valent hydrocarbon group having 1 to 20 carbon atoms, wherein, optionally, an oxygen atom, a sulfur atom, an imino group, a carbonyl group, —CO—O—, or —CO—NH— is bonded to an end of R3 which is bonded to R2, R represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R8 represents a fluorine-substituted hydrocarbon group having 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom, wherein each R8 is a same as or different from each other when n is 2 or 3, and R8 and the CO group bonded to R8 taken together are an alkali-labile group, wherein the alkali-labile group is a group that is separable to form a polar functional group in a presence of an alkali. |
地址 |
Tokyo JP |