Formation of transparent conductive zinc oxide thin film on substrate - by CVD of an organo-zinc cpd. and boron- or aluminium cpd.

摘要

Mfg. a transparent conductive ZnO thin film on a substrate by means of chemical vaporisation comprises: (1) feeding pure water and an organometallic Zn-contg. material, separately and entrained by a carrier gas, into a vacuum chamber (1) with a reduced internal pressure; (2) adjusting the gas pressure in the chamber to 1-30 torr; and (3) feeding gaseous diborane or a cpd. contg. B or Al into the vacuum chamber and heating a substrate (2) disposed in the chamber to a predetermined temp., resulting in the formation of the thin film on the substrate under the cited gas pressure. USE/ADVANTAGE - The ZnO film is used as a transparent electrode and as a non-reflecting layer for solar cells made of amorphous Si or CuInSe2. The film can be formed at a low. temp., and its surface structure can be altered by changing the film-forming conditions. The latter is partic. important if light-scattering is to be prevented in a solar cell.