| 摘要 |
PROBLEM TO BE SOLVED: To obtain a composition for a film under a resist disposed between the resist and an antireflection film, having both adhesion to the resist and resistance to a resist developing solution and also having resistance to oxygen ashing in the removal of the resist. SOLUTION: The composition contains (A) a hydrolyzate and/or a condensation product of at least one compound selected from the group comprising compounds of the formula R1aSi(OR2)4-a [where R1 is H, F or a monovalent organic group, R2 is a monovalent organic group and (a) is an integer of 0-2] and the formula R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c [where R3-R6 may be the same or different and are each a monovalent organic group, (b) and (c) may be the same or different and are each a number of 0-2, R7 is O or -(CH2)n-, (d) is 0 or 1 and (n) is a number of 1-6] and (B) a compound which generates an acid when irradiated with UV and/or heated. |
