发明名称 Trench isolation for active areas and first level conductors
摘要 A trench isolation structure for a semiconductor is provided including an isolation ring and an isolation path. The isolation ring surrounds active semiconductor areas and is bordered on the outside by inactive semiconductor area. The isolation path extends from the isolation ring through the inactive semiconductor area. A first level conductor on the isolation path electrically connects or capacitively couples a device in the active semiconductor area to a location on the substrate outside the isolation ring. The isolation path has a configuration derived from the layout of the conductor.
申请公布号 US6394638(B1) 申请公布日期 2002.05.28
申请号 US20000560212 申请日期 2000.04.28
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 SENGLE EDWARD W.;JAFFE MARK D.;MAYNARD DANIEL NELSON;LAVIN MARK ALAN;WHITE ERIC JEFFREY;BRACCHITTA JOHN A.
分类号 H01L21/762;H01L23/522;(IPC1-7):H01L21/762 主分类号 H01L21/762
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