<p>Methods for purifying liquid alkanes are provided. The methods produce alkanes having low absorbance, particularly at 193 nm. The alkane liquids are useful as immersion liquids in photomicrolithography employed for production of electronic circuits.</p>
申请公布号
WO2008033407(A1)
申请公布日期
2008.03.20
申请号
WO2007US19829
申请日期
2007.09.13
申请人
E. I. DU PONT DE NEMOURS AND COMPANY;WHELAND, ROBERT, CLAYTON;MANZER, LEO, ERNEST;PENG, SHENG
