| 摘要 |
To provide a substrate which is not substantially chipped or cracked on the substrate end faces even when the substrate is a silicon substrate made of a brittle material, and provide a substrate which prevents dust raising from the substrate end faces and prevents dust raising due to rubbing with a processing cassette. A silicon substrate for a magnetic recording medium is formed by setting the lengths L of chamfered portions between the main surfaces of the substrate and the outer circumferential side end face to 0.1±0.03 mm and setting the angles alpha between the main surfaces and the chamfered portions between the main surfaces and the outer circumferential side end face to 45 degrees ±5 degrees. It is also possible for a curved portion with a radius of 0.01 mm or more and less than 0.3 mm is interposed between the main surfaces and the outer circumferential side chamfered portions of the substrate.
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