A HIGH VACUUM MAGNETRON SPUTTER GUN

摘要

A high-vacuum magnetron sputtering gun is provided to keep the ionization density within the chamber high by ionizing the neutralized argon gas again, thereby maintaining thin film deposition efficiency and a high vacuum state within the chamber. A high-vacuum magnetron sputtering gun comprises two anodes provided on the top of a housing(12) which surrounds a sputtering target(13) and a support part(19), two filaments(51) provided on the top of each anode, a vacuum pump pipe(90), and a vacuum pump. The housing is made of a magnetic field shielding material(31) to prevent the magnetic field generated from a permanent magnet in the support part from reaching the anode. Each filament generating thermoelectron is enclosed with the housing except for the exit of thermoelectron. The vacuum pump pipe and the vacuum pump maintain the high vacuum state holding Ar gas in the housing.