| 摘要 |
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where Ris independently selected hydrogen, C-Calkyl, C-C-alkyl alcohol, hydroxy (OH), amine (NH), carboxylic acid, and amide (CONH), ~~ represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
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