发明名称 |
COPOLYMER FORMULATION FOR DIRECTED SELF-ASSEMBLY, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME |
摘要 |
Disclosed herein is a pattern forming method comprising disposing upon a substrate a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that has a lower or a higher surface energy than the block copolymer; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer of the block copolymer to form a morphology of periodic domains formed from the first polymer and the second polymer; where a longitudinal axis of the periodic domains are parallel to the substrate. |
申请公布号 |
US2016251539(A1) |
申请公布日期 |
2016.09.01 |
申请号 |
US201615052927 |
申请日期 |
2016.02.25 |
申请人 |
Dow Global Technologies LLC ;Rohm and Haas Electronic Materials LLC ;THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
Hustad Phillip D.;Trefonas, III Peter;Ginzburg Valeriy V.;Kim Bongkeun;Fredrickson Glenn H. |
分类号 |
C09D153/00;B05D3/02 |
主分类号 |
C09D153/00 |
代理机构 |
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代理人 |
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主权项 |
1. A pattern forming method comprising:
disposing upon a substrate a composition comprising:
a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure;an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that has a lower or a higher surface energy than the block copolymer; anda solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer of the block copolymer to form a morphology of periodic domains formed from the first polymer and the second polymer; where a longitudinal axis of the periodic domains are parallel to the substrate. |
地址 |
Midland MI US |