发明名称 MANUFACTURING METHOD OF TARGET MATERIAL FOR SPUTTERING TARGET, AND BOX USED THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method for manufacturing a large target material, in particular, a target material to be obtained by baking a work to be baked having the width of &ge; 250 mm in the longitudinal direction with high quality and excellent production efficiency by preventing cracks or the like by using a continuous furnace, and a baking box. <P>SOLUTION: In the method for manufacturing a target material for a sputtering target by the powder metallurgical processing method, a work to be baked is placed on a baking plate, a plurality of spacer blocks separated from each other by the predetermined spacing are arranged on a peripheral edge of the baking plate so as not to be abutted on the work placed on the baking plate, and a lid supported by the spacer blocks is provided facing the baking plate so as not to be abutted on the work placed on the backing plate. A baking box is formed thereby, and the baking box is baked in a continuous furnace to bake the work in the box. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007113051(A) 申请公布日期 2007.05.10
申请号 JP20050304694 申请日期 2005.10.19
申请人 MITSUI MINING & SMELTING CO LTD 发明人 ONO NAOKI;TAKAI KEIICHI
分类号 C23C14/34;C04B35/00;C04B35/64 主分类号 C23C14/34
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