| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new method for efficiently producing monomer useful for introducing a construction unit having a specific butyrolactone ring into an acrylic resin so as to obtain a chemical amplification type photoresist composition having good transparency to ArF excimer laser, exhibiting excellent sensitivity, resist pattern forms, dry etching resistance and adhesiveness and having high affinity to alkalis. <P>SOLUTION: The compound represented by general formula (2) (R<SP>1</SP>is H or methyl) is produced by reacting a compound represented by chemical formula (1) with acrylic acid or methacrylic acid or a functional derivative thereof. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
