| 摘要 |
A method of forming a passivation layer over a ferroelectric layer of a ferroelectric media comprises introducing the ferroelectric layer to a plasma comprising one of oxygen, oxygen-helium, and oxygen-nitrogen-helium, etching a surface of the ferroelectric layer, forming one of a substantially oxygen enriched layer and a substantially hydroxyl enriched layer at the surface of the ferroelectric layer, introducing the ferroelectric layer to an environment comprising substantially nitrogen, and maintaining the ferroelectric layer within the environment so that nitrogen enriches the substantially oxygen enriched layer to form a passivation layer.
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