| 摘要 |
<P>PROBLEM TO BE SOLVED: To quantitatively, quickly and precisely measure and evaluate a surface distortion distribution in all the observable points on a measuring objective specular or half-mirror-like surface. <P>SOLUTION: A surface distortion measuring device includes a pattern display means 2 capable of displaying switchingly a plurality of kinds of light and dark patterns 5, a photographing means 3 for photographing mirror images of the plurality of light and dark patterns reflected on the surface of the specular or half-mirror-like measuring object 1, and displayed on the pattern display means, and a surface distortion distribution computing means 10 for processing the photographed specular images of the plurality of light and dark patterns to compute the surface distortion distribution on the measuring objective surface. <P>COPYRIGHT: (C)2007,JPO&INPIT |
