发明名称 |
Electron beam exposure apparatus |
摘要 |
An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit for controlling the internal unit to a vacuum atmosphere; stage 4 A arranged in the sample chamber 3 for holding and moving the wafer 10; and first mounting 5 A for elastically supporting the column 1 with respect to the sample chamber 3.
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申请公布号 |
US7230257(B2) |
申请公布日期 |
2007.06.12 |
申请号 |
US20050074645 |
申请日期 |
2005.03.09 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
UCHIDA SHINJI |
分类号 |
G03F7/20;H01J37/304;G21K5/10;H01J37/02;H01J37/16;H01J37/20;H01J37/30;H01J37/317;H01L21/027;H01L21/68 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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