发明名称 METHOD OF MANUFACTURING RECLAIMED SEMICONDUCTOR WAFER
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for reclaiming a semiconductor wafer that is too thin to be reused.SOLUTION: A method of manufacturing a reclaimed semiconductor wafer by cutting out a new semiconductor wafer 12 having a notch 13 from a semiconductor wafer 1 having a notch 11 includes a lamination step for laminating the semiconductor wafer 1, and a cutting step for cutting out a new semiconductor wafer 12 from the laminated semiconductor wafer 1. Since a small semiconductor wafer is usable even if it is thin, even if the semiconductor wafer 1 is thin and cannot be reused, the new semiconductor wafer 12 is usable, and thereby the semiconductor wafer 1 that cannot be reused can be reclaimed to a new semiconductor wafer 12.SELECTED DRAWING: Figure 4
申请公布号 JP2016149549(A) 申请公布日期 2016.08.18
申请号 JP20160021714 申请日期 2016.02.08
申请人 MATSUZAKI SEISAKUSYO CO LTD;MATSUZAKI SHOJI CO LTD 发明人 SAKAI TOSHINORI;TANAKA TORAKATSU;SODEKAWA SADAHIRO
分类号 H01L21/304;B24B27/06 主分类号 H01L21/304
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