GAS SYSTEMS AND METHODS FOR CHAMBER PORTS

摘要

An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.

主权项

1. An electronic device manufacturing system, comprising:
a first chamber configured to receive a substrate therein; a second chamber configured to receive a substrate therein; a chamber port assembly interfacing the first chamber with the second chamber, the chamber port assembly having a substrate transfer area between the first chamber and the second chamber, the substrate transfer area configured to receive a substrate as the substrate is transferred through the chamber port assembly between the first chamber and the second chamber; a gas inlet; a gas conduit member having a gas passageway there through in fluid communication with the gas inlet; and one or more gas nozzles configured to direct a flow of gas received at the gas inlet into the substrate transfer area.