发明名称 IMPROVED MAGNETRON SPUTTERING CATHODE
摘要 <p>A superior method and magnetron sputtering cathode apparatus in which some of the flux lines forming the closed-loop magnetic tunnel are made to change their curvature from convex (17) to slightly concave (15) within a region of the tunnel intersecting the sputtering target (20) volume, and over a substantial fraction of the tunnel width. The improved field shape reduces the tendency of the eroded area of the target to become narrower as erosion progresses, and thereby allows more complete consumption of the target.</p>
申请公布号 WO1990005793(A1) 申请公布日期 1990.05.31
申请号 US1989005125 申请日期 1989.11.14
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