| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of exposing a wafer in which intervals of lines to be partitioned are different without manufacturing any mask member each time. <P>SOLUTION: The exposure device exposes along the lines to be partitioned resist films coated on the rear face or the front surface of the wafer on which a functional element is formed in a region divided by lattice like lines to be partitioned on the front surface thereof. The device includes a zipper table 3 for holding the wafer; alignment means 5 for detecting the lines to be partitioned formed on the wafer held by the zipper table 3; slit exposure means 6 for exposing a slit light corresponding to the lines to be partitioned on the resist films coated on the rear face or the front surface of the wafer held by the zipper table 3; and index means for relatively moving the zipper table 3 and the slit exposure means 6, and positioning the lines to be partitioned formed on the wafer held by the zipper table 3 at an exposure position of the slit light. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
