SUBSTRATE TABLE, METHOD FOR MEASURING POSITION OF SUBSTRATE, AND LITHOGRAPHY EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a substrate table configured so as to support a substrate comprising at least one substrate mark.

SOLUTION: The at least one substrate mark has a position that can be measured using an alignment system. The substrate table comprises an optical system having a magnification factor that is not 1 in order to provide the image of the at least one substrate mark to be measured by the alignment system.

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