| 摘要 |
A reactant gas (C) is supplied from a reactant gas supply means (1) concentratedly to active areas (A1) alone on a target article (A) , a photochemical reaction between excimer UV and the reactant gas (C) is thereby accelerated in a low-temperature atmosphere. The reactant gas (C) is not supplied to areas (A2), where the photochemical reaction does not actively occur, and is not wasted. A reactant gas source having a large gas-supply capability is not required. The photochemical reaction can be stably performed with a simple structure in a low-temperature atmosphere. <IMAGE> |
