| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of satisfactorily executing exposure processing by preventing fault in exposure due to a difference in temperature between a substrate and a holding material. <P>SOLUTION: The exposure apparatus includes a holding member having a holding surface for holding a substrate irradiated with an exposure light, and a temperature control device for controlling the temperature of the substrate before being held in the holding member depending on the temperature of the holding surface. <P>COPYRIGHT: (C)2008,JPO&INPIT |
