发明名称 |
THE APPARATUS FOR ELECTROLYTIC POLISHING AND MASK THEREUSED |
摘要 |
An electrolytic polishing equipment and a method for electrolytic polishing of the mask using the same are provided to more easily perform electrolytic polishing by removing an electric double layer formed on a mask. In an equipment(200) for electrolytic polishing of a mask(220) in which an opening is formed, the equipment comprises: an electrolyzer(210) in which an electrolyte(211) is contained such that the mask is immersed into the electrolyte; a first electrode(230) of which a portion is immersed into the electrolyte, and which comes in contact with the mask to supply a positive electric charge to the mask; a second electrode(240) of which a portion is immersed into the electrolyte, and which has a negative electric charge; and an auxiliary electrode(250) installed in at least one side of a zone corresponding to the mask, wherein the equipment further comprises a bubble generation part(270) formed in one zone within the electrolyte. The equipment further comprises a bubble generation drive part(280) and a power supply unit(260).
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申请公布号 |
KR100739298(B1) |
申请公布日期 |
2007.07.06 |
申请号 |
KR20060067391 |
申请日期 |
2006.07.19 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
HUH, MYUNG SOO;JEONG, SEOK HEON;HAN, SANG JIN;KANG, EU GENE |
分类号 |
C25F3/00 |
主分类号 |
C25F3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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