发明名称 THE APPARATUS FOR ELECTROLYTIC POLISHING AND MASK THEREUSED
摘要 An electrolytic polishing equipment and a method for electrolytic polishing of the mask using the same are provided to more easily perform electrolytic polishing by removing an electric double layer formed on a mask. In an equipment(200) for electrolytic polishing of a mask(220) in which an opening is formed, the equipment comprises: an electrolyzer(210) in which an electrolyte(211) is contained such that the mask is immersed into the electrolyte; a first electrode(230) of which a portion is immersed into the electrolyte, and which comes in contact with the mask to supply a positive electric charge to the mask; a second electrode(240) of which a portion is immersed into the electrolyte, and which has a negative electric charge; and an auxiliary electrode(250) installed in at least one side of a zone corresponding to the mask, wherein the equipment further comprises a bubble generation part(270) formed in one zone within the electrolyte. The equipment further comprises a bubble generation drive part(280) and a power supply unit(260).
申请公布号 KR100739298(B1) 申请公布日期 2007.07.06
申请号 KR20060067391 申请日期 2006.07.19
申请人 SAMSUNG SDI CO., LTD. 发明人 HUH, MYUNG SOO;JEONG, SEOK HEON;HAN, SANG JIN;KANG, EU GENE
分类号 C25F3/00 主分类号 C25F3/00
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