Exposure mask, exposure apparatus, and method for manufacturing display substrate

摘要

The present invention discloses an exposure mask, an exposure apparatus, and a method for manufacturing a display substrate, which are used for forming a pattern with a smaller aperture, a narrower slit, or a line of smaller width on a photoresist layer. The exposure mask includes a mask body and an anti-diffraction film layer located at a light emergent side of the mask body. Wherein the mask body includes a light transmissive region and a light non-transmissive region; a region of the anti-diffraction film layer which corresponds to at least the light transmissive region of the mask body is a light transmissive region; and the anti-diffraction film layer is a film layer whose refractive index n satisfies n>1.

主权项

1. An exposure mask, including a mask body and an anti-diffraction film layer located at a light emergent side of the mask body, wherein,
the mask body includes a light transmissive region and a light non-transmissive region; a region of the anti-diffraction film layer is a film layer whose entirety is light transmissive; and the anti-diffraction film layer is a film layer whose refractive index n satisfies n>1, wherein the anti-diffraction film layer is detachably connected to the mask body.