Polymer composition and method for removing contaminates from a substrate

摘要

This invention relates to an aqueous polymer composition and to films formed from this aqueous composition. The aqueous composition may be used in a method for removing contaminate material from a substrate. The aqueous polymer composition may comprise: water; and at least one water-soluble film forming polymer. In one embodiment, the aqueous composition may further comprise at least one chelating agent and/or at least one surfactant. The aqueous polymer composition may be applied to a contaminated substrate or to a clean substrate which is subjected to subsequent contamination. The aqueous composition may be dehydrated and/or the polymer may be crosslinked to form a film. When applied to a contaminated substrate, the film may combine with the contaminates. When applied to a clean substrate, the contaminate material may subsequently contact and adhere to the film. The film combined with the contaminate material may be separated from the substrate, with the result being removal of the contaminate material from the substrate.

主权项

1. A composition for removing a contaminate material comprising metal ions and/or charged particles from a substrate, the composition comprising: water; at least one water-soluble film forming polymer comprising polyvinyl alcohol with a molecular weight in the range from about 13,000 to about 250,000 g/mole and a hydrolysis level in the range from about 75% to about 100%, at least one chelating agent that contains two or more electron donor atoms for forming coordinate bonds to the metal ions and/or charged particles; sodium dodecylsulfonate; and an effective amount of at least one thixotropic additive to allow the aqueous composition to flow when under stress and to resist flow when not under stress; the aqueous composition being capable of forming a wet film on a non-horizontal substrate that upon dehydrating forms a peelable or strippable film;
wherein the chelating agent comprises ethylenediaminetetraacetic acid, diethylenetriaminepentaacetic acid, citric acid, amino acid, aminopolycarboxylic acid, organophosphonate, bisphosphonate, inorganic polyphosphate, salts of any of the foregoing chelating agents, or a mixture of two or more of the foregoing chelating agents and/or salts of the foregoing chelating agents; and wherein the at least one thixotropic additive comprises a thixotropic polymer, pseudoplastic polymer, polyurethane, polyhydroxycarboxylic acid amide, modified urea, urea modified polyurethane, hectorite clay, or a mixture of two or more thereof; and two or more leveling agents selected from polysiloxane, dimethylpolysiloxane, polyether modified dimethylpolysiloxane, polyester modified dimethylpolysiloxane, polymethylalkysiloxane, aralkyl modified polymethylalkylsiloxane, alcohol alkoxylate, polyacrylate, polymeric fluorosurfactant and fluoro modified polyacrylate.