Transmission balancing for phase shift mask with a trim mask

摘要

Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.

主权项

1. A method of photolithography, comprising:
exposing a wafer using an alternating phase shift mask (Alt-PSM) and a trim mask, wherein a center of the trim mask is shifted relative to a center of the alternating phase shift mask.