| 摘要 |
PURPOSE:To form a pattern having a rectangular cross-section and free from a trail by using a resist consisting of m-/p-cresol novolak resin dissolving in an alkali soln. at a specified speed and a quinone-diazido compd. CONSTITUTION:This pattern forming compsn. contains novolak resin consisting of units of formaldehyde, m-cresol and p-cresol and having (45:55)-(60:40) weight ratio of m-cresol:p-cresol, a condensation product of at least one kind of polyhydroxy compd. represented by formula I with 1,2 naphthoquinonediazido-4- sulfonium choloride and a solvent dissolving the novolak resin and the condensation product. In the formula I, each of R1 R2, R5 and R6 is alkyl or aryl, each of R3, R4 and R7-R12 is H, alkyl or aryl, each of R13-R15 is H, hydroxy, alkyl or aryl or aryl and at least one of R13-R15 is hydroxy. Satisfactory plasma resistance is ensured, development with an alkali soln. is enabled and a pattern having high resolving power and a rectangular profile is formed. |
