| 摘要 |
<P>PROBLEM TO BE SOLVED: To heighten a degree of vacuum and cleanliness in a plasma generating chamber by a simple structure, in a LPP type EUV light source device. <P>SOLUTION: This extreme ultraviolet light source device includes: a droplet generating chamber 100; a plasma generating chamber 110 connected to the droplet generating chamber through an opening part 101a; a nozzle 102 to supply a target substance to the inside of the plasma generating chamber; a piezo element 103 and a piezo driver 106 to generate the droplets 108 of molten metal, which repeatedly drops, based on the target substance supplied from the nozzle; a droplet interrupting unit 107 to prevent the generated droplet 108a of the target substance from passing through the opening part; a control part 115 for controlling the droplet interrupting unit so that it operates in prescribed timing; a laser light source 111 to emit laser light; and a lens 112 to apply laser light emitted from the laser light source onto the droplet 108b of the target substance, which is introduced to the plasma generating chamber by passing through the opening part. <P>COPYRIGHT: (C)2007,JPO&INPIT |
