| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of effectively correcting the sagging of a mask. <P>SOLUTION: The pressure of the top surface of the mask M varies with the flow rate, flow velocity, etc., of fluid passing between the mask M and an optical plate OT, so a controller CPU uses the variation to vary the flow rate of the liquid by adjusting a valve V while detecting flexure of the mask M by a detector DT, thereby optimizing a correction quantity of the mask M. <P>COPYRIGHT: (C)2007,JPO&INPIT |
