| 摘要 |
<p>A developing apparatus and a developing method are provided to restrain the generation of developing failure and to reduce a developing time by restraining the generation of grains from a rinse solution in spite of the increase of a contact angle of a substrate. A developing apparatus includes a rotation support unit(1) for rotating and supporting a substrate, a developer nozzle for supplying a developer to the substrate, a rinse nozzle for supplying a rinse solution to the substrate, an inert gas nozzle for supplying an inert gas to the substrate, and a control unit. The control unit(51) is used for controlling the rotation of the substrate and the supply of the developer, rinse solution and inert gas.</p> |
