发明名称 SPUTTERING AND METHODS FOR DEPOSITING A FILM CONTAINING TIN AND NIOBIUM
摘要 Sputtering targets and sputtering methods for depositing a film that includes tin and niobium. Substrates bearing coatings comprising tin and niobium, for example, low-emissivity coatings including blocker films comprising tin and niobium, or solar control coatings (e.g., conductive oxide coatings) including tin and niobium methods of manufacturing sputtering targets comprising tin and niobium.
申请公布号 WO2007070249(A3) 申请公布日期 2007.08.30
申请号 WO2006US45689 申请日期 2006.11.29
申请人 CARDINAL CG COMPANY;HARTIG, KLAUS 发明人 HARTIG, KLAUS
分类号 H01J37/34;C03C17/06;C03C17/09;C03C17/22;C03C17/245;C03C17/34;C03C17/36;C03C17/40;C23C4/12;C23C14/34;C23C14/35;E06B3/67 主分类号 H01J37/34
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