| 摘要 |
A composition for forming resist underlayer coating for a mask blank is provided to improve the resolving property of patterning of a thin film for forming transfer pattern, and the adherence with resist coatings and other base coatings. A resist underlayer coating forming composition is used for forming a mask blank comprising a thin film for forming transfer pattern, a resist underlayer coating and a chemically-amplified type resist coating, which are formed on a substrate in order, and comprises a polymer compound having a halogen atom-containing repeating structural unit and a solvent. The polymer compound is a compound containing a halogen atom in an amount of at least 10 mass % and represented by formula(1), in which L is a bonding group constituting the main chain of the polymer compound, M is a direct bond, or a linking group containing at least one selected from -C(=O)-, -CH2- or -O--, Q is an organic group, at least one of L, M and Q contains a halogen atom, and V is the number of structural units contained in the polymer compound and ranges from 1 to 3000. |
