发明名称 Cells having cavities and the manufacture and use of the same
摘要 Cells having cavities and the manufacture and use of the same are described. An example cell includes a first layer including a gap to at least partially define a cavity and a reservoir area to receive material to enter the cavity by diffusion. Additionally, the cell includes one or more other layers coupled to the first layer to at least partially define the cavity and to hermetically seal the cavity from an exterior environment.
申请公布号 US9498777(B2) 申请公布日期 2016.11.22
申请号 US201012694030 申请日期 2010.01.26
申请人 Völlm Henning;Schmid Ulrich;Schütze Andreas;Seidel Helmut;Feili Dara 发明人 Völlm Henning;Schmid Ulrich;Schütze Andreas;Seidel Helmut;Feili Dara
分类号 B01L3/00;G04F5/14;H03L7/26;G01N21/03 主分类号 B01L3/00
代理机构 Hanley, Flight & Zimmerman, LLC 代理人 Hanley, Flight & Zimmerman, LLC
主权项 1. A cell, comprising: a first substrate layer at least partially defining a cavity having an opening, the first substrate layer comprising: a wall; and a reservoir area in the wall of the first substrate layer surrounding the cavity, the reservoir area being within the first substrate layer and not being within the cavity, the reservoir area receives at least one of an alkali metal, or an alkali earth metal by ion implantation, the reservoir area comprising at least one of silicon, a structured ceramic material, glass, or a structured glass ceramic compound material, wherein, after the reservoir area receives at least one of an alkali metal, or an alkali earth metal by ion implantation, the at least one of the alkali metal, or the alkali earth metal enters the cavity by diffusion from the reservoir area, a second substrate layer coupled to the first substrate layer and covering the opening of the cavity, the second substrate layer comprising a translucent portion to enable optical access to the cavity; and a diffusion barrier immediately adjacent the reservoir area, wherein the wall defines a step and the reservoir area is disposed between the step and the diffusion barrier.
地址 Hermeskeil DE