发明名称 Positive type photosensitive quinone diazide phenolic resin composition
摘要 A positive type photosensitive resin composition contains (a) a quinone diazido phenolic resin represented by the formula: <IMAGE> (I) wherein R1 is an alkyl group having 1 to 4 carbon atoms, R2 is a bivalent hydrocarbon residue having 5 to 16 carbon atoms provided that groups bound to R2 do not bind with the same carbon atom of R2, D1, D2 and D3 and are the same or different groups and each represent a hydrogen atom or a quinone diazido unit represented by <IMAGE> <IMAGE> provided that a molar ratio of the hydrogen atom to the quinone diazido unit is 0 to 10, m is a number of 0 to 10, n is a number of 1 or 2, and l1, l2 and l3 are the same or different numbers and each represent a number of 1 to 3; and (b) an alkali-soluble resin.
申请公布号 US5368977(A) 申请公布日期 1994.11.29
申请号 US19930034357 申请日期 1993.03.19
申请人 NIPPON OIL CO. LTD. 发明人 YODA, EIJI;YUASA, HITOSHI;OTSUKI, YUTAKA
分类号 G03F7/023;(IPC1-7):G03F7/023 主分类号 G03F7/023
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