发明名称 METHOD FOR GROWING SIC SINGLE CRYSTAL
摘要 PURPOSE:To provide a method for growing an SiC single crystal ingot having few crystal defects and a low impurity content so as to produce a high quality SiC wafer. CONSTITUTION:Powdery SiC as starting material is sublimed by heating and an SiC single crystal is grown on a seed crystal made of an SiC single crystal and kept at a temp. below the temp. of the starting material. In this sublimation- recrystallization method, the temp. of the powdery SiC is slowly reduced with the lapse of growth time.
申请公布号 JPH06340498(A) 申请公布日期 1994.12.13
申请号 JP19940042708 申请日期 1994.03.14
申请人 NIPPON STEEL CORP 发明人 TAKAHASHI ATSUSHI;KANETANI MASATOSHI
分类号 C30B23/02;C30B29/36;H01L33/34 主分类号 C30B23/02
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