发明名称 |
METHOD FOR GROWING SIC SINGLE CRYSTAL |
摘要 |
PURPOSE:To provide a method for growing an SiC single crystal ingot having few crystal defects and a low impurity content so as to produce a high quality SiC wafer. CONSTITUTION:Powdery SiC as starting material is sublimed by heating and an SiC single crystal is grown on a seed crystal made of an SiC single crystal and kept at a temp. below the temp. of the starting material. In this sublimation- recrystallization method, the temp. of the powdery SiC is slowly reduced with the lapse of growth time. |
申请公布号 |
JPH06340498(A) |
申请公布日期 |
1994.12.13 |
申请号 |
JP19940042708 |
申请日期 |
1994.03.14 |
申请人 |
NIPPON STEEL CORP |
发明人 |
TAKAHASHI ATSUSHI;KANETANI MASATOSHI |
分类号 |
C30B23/02;C30B29/36;H01L33/34 |
主分类号 |
C30B23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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