发明名称 |
Full open P-N junction glass passivated silicon semiconductor diode chip and preparation method thereof |
摘要 |
<p>In a preparation stage, the whole open P-N junction of the diode is coated with a passivation glass layer. The passivation glass layer is applied to the whole cutting area of each diode chip and fired separately during the preparation procedure. The open P-N junction of the glass passivated silicon semiconductor diode chip has a positive beveled cut, thereby the reverse voltage resistance may be enhanced and the possibility of leakage may be reduced. <IMAGE></p> |
申请公布号 |
EP0818820(A1) |
申请公布日期 |
1998.01.14 |
申请号 |
EP19960401538 |
申请日期 |
1996.07.11 |
申请人 |
ZOWIE TECHNOLOGY CORP. |
发明人 |
TAI, CHAO-CHIH;JONE, EL-PON;TSAI, HUEI-JENG |
分类号 |
H01L23/051;H01L23/29;H01L23/31;(IPC1-7):H01L23/31 |
主分类号 |
H01L23/051 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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