发明名称 Full open P-N junction glass passivated silicon semiconductor diode chip and preparation method thereof
摘要 <p>In a preparation stage, the whole open P-N junction of the diode is coated with a passivation glass layer. The passivation glass layer is applied to the whole cutting area of each diode chip and fired separately during the preparation procedure. The open P-N junction of the glass passivated silicon semiconductor diode chip has a positive beveled cut, thereby the reverse voltage resistance may be enhanced and the possibility of leakage may be reduced. <IMAGE></p>
申请公布号 EP0818820(A1) 申请公布日期 1998.01.14
申请号 EP19960401538 申请日期 1996.07.11
申请人 ZOWIE TECHNOLOGY CORP. 发明人 TAI, CHAO-CHIH;JONE, EL-PON;TSAI, HUEI-JENG
分类号 H01L23/051;H01L23/29;H01L23/31;(IPC1-7):H01L23/31 主分类号 H01L23/051
代理机构 代理人
主权项
地址