METHOD OF FORMING DIELECTRIC FILMS, NEW PRECURSORS AND THEIR USE IN THE SEMI-CONDUCTOR MANUFACTURING
摘要
Method of deposition on a substrate, of a metal containing dielectric film comprising a compound of the formula (I): (M<SUP>1</SUP> <SUB>1-a </su
申请公布号
WO2007141059(A2)
申请公布日期
2007.12.13
申请号
WO2007EP52507
申请日期
2007.03.16
申请人
L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;DUSSARRAT, CHRISTIAN;BLASCO, NICOLAS;PINCHART, AUDREY;LACHAUD, CHRISTOPHE
