发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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申请公布号 |
US2008218717(A1) |
申请公布日期 |
2008.09.11 |
申请号 |
US20080068546 |
申请日期 |
2008.02.07 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
STREEFKERK BOB;BASELMANS JOHANNES JACOBUS MATHEUS;COX HENRIKUS HERMAN MARIE;DERKSEN ANTONIUS THEODORUS ANNA MARIA;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;LOF JOERI;LOOPSTRA ERIK ROELOF;MERTENS JEROEN JOHANNES SOPHIA MARIA;MEULEN FRITS VAN DER;MULKENS JOHANNES CATHARINUS HUBERTUS;NUNEN GERARDUS PETRUS MATTHIJS VAN;SIMON KLAUS;SLAGHEKKE BERNARDUS ANTONIUS;STRAAIJER ALEXANDER;TOORN JAN-GERARD CORNELIS VAN DER;HOUKES MARTIJN |
分类号 |
G03B27/42;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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