发明名称 SURFACE TREATMENT METHOD OF ITO USING OXYGEN PLASMA AND THERMAL TREATMENT AND OLED DEVICE USING THE SAME METHOD
摘要 An ITO(Indium Tin Oxide) surface treatment method using an oxygen plasma and an OLED device using the same are provided to enhance an absorption property of oxygen by accelerating a reaction speed of an oxygen plasma process. A multilayer OLED(Organic Light Emitting Device) includes an anode(2), a first region(3), an HTL(Hole Transport Layer)(4), an EML(Emitting Layer)(5), a buffer layer(6), and a cathode(7). An oxygen plasma thermal treatment is performed on the first region on an ITO. Holes are transferred in the HTL. Holes are combined with electrons in the EML. The cathode is made of aluminum. A transparent material is used for forming one electrode of a substrate, such that the light is emitted from the OLED. The transparent material is used as the anode, which injects the holes. The HTL is made of TPD(Triphenyl Diamine).
申请公布号 KR20070098314(A) 申请公布日期 2007.10.05
申请号 KR20060029823 申请日期 2006.03.31
申请人 SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION 发明人 CHAE, HEE YEOP;JANG, SUN GI;LEE, JAE WON;JEONG, DONG HUN
分类号 H05B33/10 主分类号 H05B33/10
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