| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus with advantageous in the performance of superposition.SOLUTION: An lithographic apparatus (1) forming a pattern to a substrate, comprises: a movable stage (5) that holds the substrate; an irradiation part (13) that irradiates a beam for forming the pattern to the substrate; and a control part (200) that controls the stage and irradiation part so as to perform a first processing that forms a first mark for detecting the superposition facing to a 0-th mark without forming the pattern to the substrate including the 0-th mark for detecting the superposition and a second mark for detecting the superposition, and a second processing that forms a third mark for detecting the superposition facing to the second mark forming the pattern.SELECTED DRAWING: Figure 4 |
