发明名称 SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS
摘要 A solid-state imaging device includes an Si substrate in which a photoelectric conversion unit that photoelectrically converts visible light incident from a back surface side is formed, and a lower substrate provided under the Si substrate and configured to photoelectrically convert infrared light incident from the back surface side.
申请公布号 US2016181305(A1) 申请公布日期 2016.06.23
申请号 US201615054677 申请日期 2016.02.26
申请人 Sony Corporation 发明人 Mabuchi Keiji;Abe Hideshi;Kanbe Hideo;Uchida Shiro
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
主权项 1. A method of manufacturing an imaging device, the method comprising: forming, by a manufacturing device, a photoelectric conversion unit that photoelectrically converts visible light incident from a back surface side, in a Si substrate; and affixing, by a manufacturing device, a lower substrate that photoelectrically converts infrared light incident from the back surface side, under the Si substrate.
地址 Tokyo JP