发明名称 |
SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS |
摘要 |
A solid-state imaging device includes an Si substrate in which a photoelectric conversion unit that photoelectrically converts visible light incident from a back surface side is formed, and a lower substrate provided under the Si substrate and configured to photoelectrically convert infrared light incident from the back surface side. |
申请公布号 |
US2016181305(A1) |
申请公布日期 |
2016.06.23 |
申请号 |
US201615054677 |
申请日期 |
2016.02.26 |
申请人 |
Sony Corporation |
发明人 |
Mabuchi Keiji;Abe Hideshi;Kanbe Hideo;Uchida Shiro |
分类号 |
H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing an imaging device, the method comprising:
forming, by a manufacturing device, a photoelectric conversion unit that photoelectrically converts visible light incident from a back surface side, in a Si substrate; and affixing, by a manufacturing device, a lower substrate that photoelectrically converts infrared light incident from the back surface side, under the Si substrate. |
地址 |
Tokyo JP |